F02800 - SEMI F28 - プロセスパネルからのパーティクル発生を測定するテスト方法 Revision:SEMI F28-1103 (Reapproved 0710) - Superseded SEMI F81-0611 (technical revision)

SEMI F81-0611 (technical revision)

The purpose of this Document is to standardize requirements for phosphoric etchants used in the semiconductor industry and testing procedures to support those standards

for both major modules and the overall equipment

Currently it is still difficult to implement instruments to replace human inspectors for Mura inspections of LCDs

F02800 - SEMI F28 - プロセスパネルからのパーティクル発生を測定するテスト方法 Revision:SEMI F28-1103 (Reapproved 0710) - Superseded SEMI F81-0611 (technical revision)global Gases Committee2010430global Audits and Reviews Subcommittee20106www. semi. org1997200311 Referenced SEMI Standards None.